Fabrication of Nanowire Using Ash Trimming Technique

Author:

Adam Tijjani1,Hashim U.1,Leow Pei Ling2,Humayun Q.1

Affiliation:

1. Universiti Malaysia Perlis (UniMAP)

2. Universiti Teknologi Malaysia (UTM)

Abstract

The paper present a report on fabrication of Nanowire using plasma oxidation, we monitor changes by studying the morphology and Δw / Δh, the study also revealed that the proposed fabrication method could potentially be used to fabricate specific nanometer-scale structure and space structure with uniform surface morphology without any damage to the photoresist. Yet with reduced ashing time and without popping of the photoresist ashing process when the a fabricated is being carried out and subsequently trimmed to nanosize by plasma oxidation, the study also revealed the dramatic increase in aspect ratio as the structure reduces in lateral dimension.

Publisher

Trans Tech Publications, Ltd.

Subject

General Engineering

Reference14 articles.

1. T. Tsakalokos, I.A. ovid'ko, A.K. Vasudevan (2000), Nanostructures: Synthesis, functional properties and Applications, Vol 128, Mathematics, Physic and Chemistry.

2. Bhushan(1995), Handbook of Micro/Nano Tribology, CRC, BocaRaton, FL.

3. R.P. Feymnan, There's plenty of room at the bottom, Engineering and source, 23: 22-36, (1960).

4. SIA. International technology roadmap for semiconductor, (2000).

5. M. Ohring. (2002), Materials Science of Thin Films, Deposition and structure, Hoboken, New Jersey.

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