Abstract
In this article, the polystyrene (PS) microspheres monolayer film was manufactured on silicon substrate by spin-coating, and the effect of PS microspheres concentration on preparation of monolayer film was discussed in detail. With a view to the application of graphic substrate technology, the etching effect with different technological parameter (etching time and power) was researched, and a set of appropriate process parameter were obtained, which met the requirements of preparation of the extension graphics silicon substrate.
Publisher
Trans Tech Publications, Ltd.
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