Affiliation:
1. Henan Institute of Science and Technology
Abstract
In this paper, a series of chemical mechanical polishing (CMP) experiments for magnesia alumina (Mg-Al) spinel were carried out with different abrasives, and the materials removal rate (MRR) and surface quality was evaluated to explore their different effects. The scanning electron microscope (SEM) and laser particle size analyzer were also employed to test the micro-shape and size distribution of abrasives. Then, the mechanism of different effects with different abrasives was analyzed in CMP for Mg-Al spinel. Those experimental results suggest that different subjecting pressure ratios of abrasives to polishing pad with different abrasive are the key factors leading to difference polishing performances in CMP.
Publisher
Trans Tech Publications, Ltd.
Subject
Mechanical Engineering,Mechanics of Materials,General Materials Science
Reference18 articles.
1. Gentilman R L. Fusion-Casting of Transparent spinel for 7075 Al alloy SiC composite. Am. Ceram. Bull, 60(1981)906-909.
2. Roy. D. W. Polycrystalline MgAl2O4 spinel for use as windows and domes from 0.3 to 6.0 mierons. SPIE, 50(1984)12-18.
3. Wang C T, Lin L S. Preparation of MgA12O4 spinel powders via freeze-drying of alkoixde precursors. J.Am.ceram.Soe, 75(1992)2240-2243.
4. Walshr J, Herzog A H. Process for polishing semiconductor materials:US, 3170273. 1965-02-23.
5. Guo Dongming,Kang Renke,Su Jianxiu, et,al. Future development on wafer planarization technology in ULSI fabrication. Chinese Journal of Mechanical Engineering, 39(2003) 100-105.