Affiliation:
1. GuiLin University of Electronic Technology
2. Guizhou University for Nationalities
Abstract
The image distortion which comes from aberration is analyzed and the effects on focal line features are also discussed, which are resulted from the spherical aberration, chromatic aberration and beam spread. The simulation results have show that source imperfection, especially the transverse velocity spread, plays a critical role in broadening the feature width.
Publisher
Trans Tech Publications, Ltd.
Reference6 articles.
1. U. Drodofsky, M, Drewsen, T. Pfau, S. Nowack, and J. Mlynek. Atom lithography using light forces, Microelectronic engineering 30, 383-386(1996).
2. E, Jurdik, J. Hohlfeld, H. van Kempen, and Th. Rasing. Laser-focused nanofabrication: beating of two atomic resonances, Applied physics letters 23, 4443-4445(2002).
3. Jabez J. McClelland, Shanno B. Hill, Marin Pichler, and Robert J. Celotta. Nanotechnology with atom optics, Science and technology of advanced materials 5, 575-580(2004).
4. Xiangzhong Chen, Hanming Yao, and Xunan Chen. Classical simulation of atomic beam focusing and deposition for atom lithography, Chinese optical letters 2, 187-189(2004).
5. M. Mutzel, U. Rasbach, D. Meschede, C. Burstedde, J. Braun, A. Kunoth, K. Peithmann, and K. Buse. Atomic nanofabrication with complex light fields, Applied physics B 77, 1-9(2003).