Analysis of Aluminium Ion Implantation Damage into 6H-SiC Epilayers
Author:
Affiliation:
1. Imperial College London
2. Universitat Autònoma de Barcelona
3. Domaine de Corbeville
4. IMB-CNM, CSIC
5. CNR-IMM Sezione di Bologna
Publisher
Trans Tech Publications, Ltd.
Subject
Mechanical Engineering,Mechanics of Materials,Condensed Matter Physics,General Materials Science
Link
https://www.scientific.net/MSF.264-268.733.pdf
Cited by 7 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献
1. Theoretical and experimental investigations of defect evolution in silicon carbide during N+ and Al+ ion implantation taking into account internal stress fields;Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms;2001-05
2. Planar p-n Diodes Fabricated by MeV-Energy and High-Temperature Selective Implantation of Aluminum to 4H-SiC;Materials Science Forum;2001-01
3. The Monte Carlo Binary Collision Approximation Applied to the Simulation of the Ion Implantation Process in Single Crystal SiC: High Dose Effects;Materials Science Forum;2001-01
4. Structural and compositional characterization of 6H–SiC implanted with N+ and Al+ ions using optical methods;Diamond and Related Materials;1999-03
5. Binary collision approximation modeling of ion-induced damage effects in crystalline 6H–SiC;Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms;1999-01
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