Properties of Oxide Film on the Surface of ZrHX(x=0~2)

Author:

Chen Wei Dong1,Yan Shu Fang1,Zhong Xue Kui1

Affiliation:

1. Inner Mongolia University of Technology

Abstract

Oxidation behaviors of ZrHx(x=0~2) in O2at 600°C were investigated. The influences of temperature and oxidation time on mass gain of the oxide film were studied. The phase structure and morphology of the oxide film were analyzed by X-ray diffraction (XRD) and Scanning Electron Microscopy (SEM). The result indicates that the oxidation behavior of zirconium is greatly changed after absorbing hydrogen. The oxidation rate of zirconium hydride decreased with increasing of hydrogen content. The thickness of the oxide film decreases and the uniformity of oxide film declined with increasing of x value. Some holes and creaks present in the oxide films when x value is 1.8 and 2. The similar textured oxide film on the surface of ZrHx(x=0~2) is found and the main phase of the oxide films is monoclinic ZrO2of the baddeleyite structure. A detectable amount of tetragonal ZrO2appeal in all the samples. A protective textured oxide film can be formed on the surface of ZrHx(x=0~2), making it ingerate and thick is important to reduce hydrogen loss.

Publisher

Trans Tech Publications, Ltd.

Subject

Mechanical Engineering,Mechanics of Materials,Condensed Matter Physics,General Materials Science

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