A Comparative Study of the Crystal Growth Techniques of Silicon Carbide, Technology Adaption and the Road to Low Cost Silicon Carbide Materials

Author:

Raghavan Parthasarathy S.1,Drachev Roman1,Bathey Bala1,Chou Henry1

Affiliation:

1. GT Advanced Technologies

Abstract

The growing demand for power electronic device for automotive, photovoltaic, transportation, motor drives creates an enormous demand for widebandgap semiconducting materials such as silicon carbide (SiC) and gallium nitride (GaN). While GaN based devices can be used for low voltages, SiC is the workhorse for voltages >600. Progress in the availability of larger diameter SiC wafers has driven the final cost of device assembly down. In this paper we compare different growth techniques for growing high quality SiC crystals, technology adaption and road to low cost SiC materials. GT Advanced Technologies has been involved in SiC sublimation equipment manufacturing since the year 2000 and the results from our 100 mm and 150 mm SiC crystals show high epi-quality.

Publisher

Trans Tech Publications, Ltd.

Subject

Mechanical Engineering,Mechanics of Materials,Condensed Matter Physics,General Materials Science

Reference5 articles.

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2. Yu. M. Tairov and V. F. Tsvetkov. Investigation of growth processes of ingots of silicon carbide single crystals. Journal of Crystal Growth, 43:209-212, (1978).

3. O. Kordina, C. Hallin, A. Ellison, High temperature chemical vapor deposition of SiC, Appl. Phys. Lett. 69 (1996) 1456.

4. R.V. Drachev, G.D. Straty, D. I. Cherednichenko, I.I. Khlebnikov and T.S. Sudarshan, J. Cryst. Growth 233 (2001) 541.

5. D. Hofmann, E. Schmitt, M. Bickermann, M. Kolbl, P. J. Wellmann, A. Winnacker, Material Science and Engineering B61-62 (1999) 48.

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