All-Wet, Metal-Compatible High-Dose-Implanted Photoresist Strip
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Published:2012-04
Issue:
Volume:187
Page:101-104
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ISSN:1662-9779
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Container-title:Solid State Phenomena
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language:
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Short-container-title:SSP
Author:
Totir George G.1, Khojasteh Mahmoud1, Nunes Ronald1, Cooper Emanuel I.2, Kern Matthew2, van Berkel Kim3, Payne Makonnen3, Dellaguardia Ronald1, To Bang1, Maurer Siegfried1
Affiliation:
1. IBM Research 2. Advanced Technology Materials Incorporation 3. Intermolecular Incorporation
Abstract
An all-wet process based on a novel chemistry has been developed to enable the removal of high-dose implanted photoresist in the presence of exposed metal layers and other materials typical of advanced gate stacks.
Publisher
Trans Tech Publications, Ltd.
Subject
Condensed Matter Physics,General Materials Science,Atomic and Molecular Physics, and Optics
Reference10 articles.
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