Diamond Films Synthesis with a DC Arc Plasma Jet: Effect of Substrate Temperature on Quality of Diamond Films

Author:

Chen Rong Fa1,Dai Liang Gang1,Zhu Rui2,Zhang Xian Liang1,Liu Tao1,Pan Yi1,Zuo Dun Weng3

Affiliation:

1. Yang Zhou University

2. Yangzhou University

3. Nanjing University of Aeronautics and Astronautics

Abstract

. High quality diamond film wafers with different thickness are prepared by high power DC arc plasma jet CVD (DCPJ CVD) method using a CH4/Ar/H2 gas mixture. The effect of substrate temperature on the quality of diamond film was studied with theoretical analysis and experimental investigation. The results indicate that different structures in diamond film may grow with different substrate temperatures. The temperatures of 800°C, 900°C and 1000°C were tested in the experiments. The quality of diamond film showed the best at the temperature of 900°C. Characterization by X-ray diffraction, Raman spectroscopy and SEM analysis are also carried out.

Publisher

Trans Tech Publications, Ltd.

Subject

Condensed Matter Physics,General Materials Science,Atomic and Molecular Physics, and Optics

Reference8 articles.

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2. D. Friedericke and et al: Surf. and Coat. Tech. Vol. 119(5) (1999), pp: 428-439.

3. F. X. Lu and et al: Diam. Relat. Mater. Vol. 7(6) (1998), pp: 737-741.

4. F. X. Lu and et al: Diam. Relat. Mater. Vol. 10(9) (2001), pp: 1551-1558.

5. R.F. Chen and et al: J. Aeronautical Mater. Vol. 26(1) (2006), pp: 20-24.

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