Deposition and Characterization of Nanostructural IrOx by RF Sputtering

Author:

Tiong Kwong Kau1,Lin Cheng Hsien2,Chen Yi Min2,Huang Ying Sheng2,Lee Kuei Yi2,Tsai Dah Shyang2

Affiliation:

1. National Taiwan Ocean University

2. National Taiwan University of Science and Technology

Abstract

Large surface area nanostructural IrOx films were deposited on stainless steel substrates by reactive radio frequency magnetron sputtering using Ir metal target. The structural and spectroscopic properties of the nanostructural IrOx were characterized. The micrographs of field emission scanning electron microscopy showed the formation of folded leaves with chiffon-like structure for the as-deposited samples. X-ray photoelectron spectroscopy analysis provided the information of the oxidation states and the stoichiometry of IrOxNL. Raman spectra revealed the amorphous-like phase of the as-deposited nanostructural IrOx. The chiffon-like structure provides ultra-high surface area for electrical charge storage which makes the IrOxNL as an attractive candidate for the supercapacitor application.

Publisher

Trans Tech Publications, Ltd.

Subject

Condensed Matter Physics,General Materials Science,Atomic and Molecular Physics, and Optics

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