1. T. Hattori, T. Osaka, A. Okamoto, K. Saga and H. Kuniyasu: Journal of the Electrochemical Society 149-9 (1998), pp.3278-3284.
2. M. Paunovic and M. Schlesinger: Fundamentals of Electrochemical Deposition (Wiley-Interscience, 1998).
3. J. G. Park: Japanese Journal of Applied Physics 36-9 (1997), pp.5416-5420.
4. Kern, W.: Handbook of Semiconductor Wafer Cleaning Technology - Science, Technology and Applications (William Andrew Publishing, 1993).
5. Hattori, T.: Solid State Technology 42 (1999), pp.73-80.