Characteristics of Inductive Coupled Plasma with Internal Linear Antenna Using Multi-Polar Magnetic Field for FPD Processing

Abstract

An internal linear inductive antenna referred to as “double comb-type antenna” was used for a large-area plasma source with the substrate area of 880mm × 660mm and the effects of multi-polar magnetic field applied by inserting permanent magnets parallel to the linear internal antennas on the plasma characteristics were investigated. By applying the multi-polar magnetic field, high density plasmas on the order of 3.2 × 1011-3 which is 50% higher than that obtained for the source without multi-polar magnetic field could be obtained at the RF power of 5000W. Also stable impedance matching with a low Q-factor of the plasma system could be obtained. The application of the multi-polar magnetic field not only increased the plasma density but also improved the plasma uniformity (less than 3%) within the 880mm × 660mm processing area.