Direct vs. Indirect Megasonic Tank Cleaning Systems; Uniformity, Cleaning Efficiency and Cost of Ownership
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Published:2012-12
Issue:
Volume:195
Page:201-204
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ISSN:1662-9779
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Container-title:Solid State Phenomena
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language:
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Short-container-title:SSP
Author:
Desagher J.1,
Dussault Don2,
Beck M.2,
Lillard R.2,
Liebscher Eric2
Affiliation:
1. Semiconductor
2. Product Systems Incorporation
Abstract
High frequency (1 MHz, megasonic) acoustic enhanced cleaning is a well established method of removing surface particles in semiconductor manufacturing processes. There are two fundamental designs of megasonic batch cleaning systems, indirect and direct.
Publisher
Trans Tech Publications, Ltd.
Subject
Condensed Matter Physics,General Materials Science,Atomic and Molecular Physics, and Optics
Reference3 articles.
1. H. Hatano, S. Kanai, IEEE Transactions Vol 43. No. 4 (1996).
2. G. Klusewitz and J. McVeigh, MICRO, (2002).
3. J. D. Cheeke, Ultrasonic Waves, CRC Press, (2002).