Microstructure and Magnetic Properties of C-Axis-Oriented Mo/NdFeB/Mo Films

Abstract

Mo/NdFeB/Mo thin flms were deposited by dc-magnetron sputtering onto Si substrates, then were annealed at 650 °C for 30 min. Nanostructured Mo/NdFeB/Mo films were successfully obtained with the magnetic easy axis of NdFeB perpendicular to the film plane. It was found that the c-axis orientation depends on the NdFeB sputter power. Good c-axis orientation was obtained at 40W NdFeB sputter power. Meanwhile, Mo layer can not only induce the c-axis orientation of NdFeB, but also improve the crystallization of NdFeB grains.