Deposition Behavior of Volatile Acidic Contaminants on Metallic Interconnect Surfaces-Reference-Cited by-同舟云学术

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Deposition Behavior of Volatile Acidic Contaminants on Metallic Interconnect Surfaces

Published:2005-04 Issue: Volume:103-104 Page:365-368
ISSN:1662-9779
Container-title:Solid State Phenomena
language:
Short-container-title:SSP

Author:

Fontaine Hervé¹,Veillerot Marc²,Danel Adrien³

Affiliation:

1. CEA-DRT LETI

2. CEA-LETI

3. Savoie Technolac

Publisher

Trans Tech Publications, Ltd.

Subject

Condensed Matter Physics,General Materials Science,Atomic and Molecular Physics, and Optics

Link

https://www.scientific.net/SSP.103-104.365.pdf

Reference6 articles.

1. International Technology Roadmap for Semiconductors (2003 edition) (see e. g. http: /public. itrs. net ).

2. K. Momoji, K. Takeda &al. Proceeding of IEST (2002).

3. L.W. Shive, R. Blank and K. Lamb. Micro Magazine (march 2001).

4. P. Sun, M. Adams, L. Shive, S. Pirooz. SPIE 3215, 118-127, (1997).

5. M. Pourbaix. Atlas of electrochemical equilibria in aqueous solutions. Ed. NACE, Houston, Texas, USA (1974).

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