Affiliation:
1. Ming-Hsin University of Science and Technology
2. Ming-Hsin University of Science & Technology
Abstract
The deterioration of continuous-wave green laser-crystallized (CLC) single-grainlike polycrystalline silicon n-channel thin-film transistors (poly-Si n-TFTs) under surface channel hot-carrier (CHC) stress (VDS=16 V and VGS=16 V labeled as a CHC-1 stress) was studied. The electrical properties of trap states containing interface trap states of gate oxide and poly-Si channel and grain boundary trap states were characterized by capacitance-voltage (C-V) measurement. In addition, while a higher stress voltage, CHC-2 stress at VDS=18 V and VGS=18 V, was adopted, the increase of interface trapped charges was obviously observed.
Publisher
Trans Tech Publications, Ltd.