A Study on the Effect of Process Parameters on Surface Topography of Al Thin Films on Various Substrates Using AFM

Author:

Shanmugan S.1,Mutharasu D.1,Hassan Z.1,Hassan H. Abu.1

Affiliation:

1. Universiti Sains Malaysia (USM)

Abstract

Al thin films were prepared over different substrates at various process conditions using DC sputtering. The surface topography of all prepared films was examined using AFM technique. Very smooth, uniform and dense surface were observed for Al films coated over Glass substrates. The observed particle size was nano scale (20 -70 nm) for Glass substrates. Sputtering power showed immense effect on surface roughness with respective to Ar gas flow rate. Noticeable change on surface with large particles was observed in Copper substrates at various sputtering power and gas flow rate.

Publisher

Trans Tech Publications, Ltd.

Subject

General Engineering

Cited by 1 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献

1. Electrical and optical properties of nano aluminum film/particle structure;Journal of Wuhan University of Technology-Mater. Sci. Ed.;2017-10

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