Response Frequency Characteristic under Loop Stress for the Material Deposited NiTi SMA Thin Film on PZT Substrate

Abstract

The materials deposited NiTi SMA Thin Film on PZT Substrate is prepared by using the magnetron sputtering method and crystallizing at 600°C. The microstructure of the materials is evaluated by scanning electron microscopy (SEM), X-ray diffraction (XRD) and energy dispersed spectroscopy (EDS). The response frequency characteristic under loop stress is studied by damping test. The results show that the NiTi SMA thin film has oriented columnar crystals and the PZT substrate has uniformly equiaxed grains. There isnt obvious component exchange between NiTi SMA thin film and the PZT substrate, especially, there is of the original composition in the region adjacent to the NiTi SMA thin film of the PZT substrate. The deposition of NiTi SMA thin film has no impact to response frequency range under loop stress of the PZT.