Effect of Deposition and Storage Conditions on the Gas Permeability of SiOx Thin Films

Author:

Toshiro Kobayashi1,Susumu Kamikawa2,Yoshifumi Itou3,Hideyuki Kanematsu4,Yuichi Utsumi5

Affiliation:

1. Tsuyama National College of Technology

2. Mitsubishi-Hitachi Metals Machinery, Inc.

3. Kurume National College of Technology

4. Suzuka National College of Technology

5. University of Hyogo

Abstract

SiOx films (80 nm thick) were vacuum deposited onto a 25-μm-thick polyethylene terephthalate (PET) substrate under various conditions. The effects of chamber pressure, evaporating temperature, and chamber gas composition on the time evolution of the oxygen transmission rate (OTR) were investigated together with changes in the films composition. It was found that the OTR decreases over time when the films are left in air, the rate of the decrease being greater at higher pressures during the formation of the films. However, if the pressure is too high, the OTR immediately reaches a high value after evaporation and does not decrease over time, not even if the films are left in air for a week. It is possible to obtain acceptable low OTR values by employing a moderate operating pressure, a suitable evaporating temperature, and an aging treatment after deposition without using a high-capacity vacuum system and without heat damage of the plastic film substrate.

Publisher

Trans Tech Publications, Ltd.

Reference6 articles.

1. R. S. A . Kelly: Society of Vacuum Coaters 36th Annual Technical Conference Proceedings (1993), p.312.

2. S. Shiller, M. Neumann, H. Morgner and N. Shiller: Society of Vacuum Coaters 36th Annual Technical Conference Proceedings (1993), p.278.

3. T. Kobayashi, M. Ogawa, Y. Nakano, S. Kamikawa, and Y. Itoh: J. Japan Inst. Metals 70(2006) , pp.154-157.

4. S. Schiller and G. Beister: Surface and Coatings Technol. 33(1987), pp.367-377.

5. Y. Nishiyama, T. Inagaki, H. Sasaki: FUJITSU scientific & Technical Journal May(1966), pp.87-116.

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