Influential Factors on Microstructure of LaB6 Films

Abstract

LaB6 films are deposited by magnetron sputtering deposition. ZrO2 glass is used as substrate. Bias voltage and substrate temperature are adjusted. Morphology of films that deposited at different parameters is characterized by AFM. Results of AFM shows that grains diameter on surface of LaB6 films is nanoscale, and roughness of the surface is less than 20nm. LaB6 crystallites are seen to cover substrate surface entirely. Structure of films is smooth and compactness, and there is no obviously default is found. Bias-voltage influences morphologies of films more obviously than substrate. The best bias voltage is-100V. Structure of film that deposited at 450°C is more compactness than others, and roughness of the film is least.