RETRACTED: Correlation of the Transition Metal Compound Ternary Nitride Thin Films

Abstract

Thin films of MXN (M stands for early transition metal and X = Si, Ge, Sn) are studied as protective coatings. To extend the knowledge about the formation of nanocomposite films, various MXN systems have been compared. TiSiN, TiGeN, TiSnN, NbSiN, ZrSiN and CrSiN thin films were deposited by reactive magnetron sputtering, from confocal targets in a mixed Ar/N2 atmosphere. The chemical reactivity of germanium and tin with nitrogen is significantly lower than that of Si and Ti. Therefore, the TiGeN and TiSnN systems are different from TiSiN. Important changes in the morphology and structure of MXNfilms are induced by X addition. Nanocrystalline composite films are formed in all these investigated ternary systems.