Affiliation:
1. Yunnan University
2. Kunming University of Science and Technology
Abstract
The anodic current-potential behaviors of PS fabrication by doubled-cell electrochemical etching method have been studied. There are three reaction regions: porous silicon formation region, a transition region and electropolishing region in I-V curves. Polishing current and the HF acid concentration has a directly proportional relationship, the electropolishing current of silicon increased with the increase of the concentration of HF, in a certain concentration range. The electropolishing current of silicon increased with increasing the sweep rate on the condition of the same HF concentration.
Publisher
Trans Tech Publications, Ltd.
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