Curing Kinetics of Silicone Epoxy Resin Containing Fluorene

Author:

Deng Wei Xing1,Zhong Yuan Wei1,Qin Jie1,Huang Xue Bing1,Peng Jin Wen1

Affiliation:

1. Guilin University of Technology

Abstract

A new epoxy resin based on dichlorosilane and 9,9-bis (4-hydroxyphenyl) fluorene was synthesized to produce a highly heat-resistant network. The chemical structure was characterized with FTIR spectroscopy and 1H-NMR. 4-4′-Diaminodiphenylsulfone (DDS) was used as the curing agent. The curing kinetics of different epoxy/DDS systems were investigated using non-isothermal differential scanning calorimetry (DSC). The results showed that the values of activation energy (E) were affected by the chemical structure of epoxy resin, and BPEBF exhibited lower curing reactivity towards DDS compared to E-51.

Publisher

Trans Tech Publications, Ltd.

Subject

General Engineering

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