Formation of a Low Reflective Surface on Silicon Solar Cells by Chemical Treatment Using Ag-Assisted Electroless Etching

Abstract

The Ag-assisted electroless etching of p-type silicon substrate in HF/H2O2solution at room temperature was investigated. The porous silicon layer was formed in a mixed solution of H2O2and HF by using screen-printed Ag front electrodes as the catalyst. And influence of the different concentration etching solution (HF and AgNO3) on the porous silicon layer was study by scanning electron microscopy (SEM). Through investigation of the track of catalyst particles, it was shown that Ag really catalyses the etching of silicon underneath Ag particle.