Researched on Dielectric Properties of Alumina Substrate Material

Author:

Guo Chen Jie1,Zhang Chang Song1

Affiliation:

1. Shaanxi University of Science and Technoloty

Abstract

In this paper, Al2O3-Bi2O3was choosed as chip fuse matrix material. Composition of Al2O3-Bi2O3ceramics samples in different sintering temperature was studied by X-ray diffraction, and dielectric properties of samples under different frequency was measured. The results show that the mixture of Bi2O3in Al2O3ceramics can improve the sintering activity of Al2O3ceramics, and thus greatly reduced the ceramic sintering temperature. It is concluded that the main crystalline phase is pure α-Al2O3without miscellaneous phase distribution. The distribution of fracture morphology is uniform without the existence of apparent stomatal, the dielectric constant and dielectric loss was studied.

Publisher

Trans Tech Publications, Ltd.

Subject

General Engineering

Reference7 articles.

1. Hilkat Erkalfa, Zulal Misirli, Tarik Baykara. Densification of Aulmina at 1250˚C with MnO2 and TiO2 Additives[J]. Ceramics International, 1995, 21: 345-348.

2. Ramesh, Lee J, Sands T, et al. Oriented ferroelectric La-Sr-Co-O/Pb-La-Zr-Ti-O/La-Sr-Co-O beterostructures on.

3. Pt/SiO2/Si substrate using a bismuth titanate template layer [J]. Appl Phys Lett, 1994, 64: 25112513.

4. Yu T, Chen Y F, Liu Z G, et al. Epitaxial Pb(Zr0. 53Ti0. 47)O /LiNiO3 heterostructures on single crystal substractes[J]. Appl Phys Lett, 1996, 69: 2092-(2094).

5. Zhu Peinan, Guo Jingkun. The relationship and microstructure of sintering reaction of the formation Li2O2-MgO2-CaO2-Al2O3-2SiO2 Microcrystalline glass[J]. Glass and Enamel, 1994, 22 (4): 1-5.

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