Atomic Diffusion of Al and Si in Cu44.25Ag14.75Zr36Ti5 Bulk Metallic Glass

Author:

Yu Wei Yuan1,Wang You Liang1,Lu Wen Jiang1

Affiliation:

1. Lanzhou University of Technology

Abstract

Secondary ion mass spectroscopy (SIMS) has been adopted to study the diffusion of Al and Si in Cu44.25Ag14.75Zr36Ti5bulk metallic glass (BMG). It has been found that around the transition temperature of metallic glass, the relation between its diffusion coefficient and the temperature satisfy the same Arrhenius relation, which means the metallic transition has not caused change to the diffusion mechanism. In addition, the radius of Al atom is close to that of Si atom, but under the same temperature and time condition, the diffusion coefficient of Si atom in bulk metallic glass (BMG) is twice that of the Al atom, while there is not a big difference in diffusion activation energy. This is because as non-metallic element, the radius of Si atom has a strong binding force with the metal atoms in the base material, which also has a bigger diffusion coefficient.

Publisher

Trans Tech Publications, Ltd.

Subject

General Engineering

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