Effects of Working Pressure on the Microstructure and Properties of ZnO Thin Films Prepared by DC Magnetron Sputtering

Abstract

ZnO thin films were prepared by DC magnetron sputtering. The effects working pressures on the microstructure, optical properties and the photoluminescent properties were studied. The results show that ZnO thin films were successfully prepared with preferred orientation growth, showing structure of single crystal. The transmission of all the ZnO thin films kept above 85%. With increasing the working pressure, the surface of ZnO thin film became coarse, the intensity of X-ray diffraction peak decreased and the transmission of the film decreased and then increased. The intensity of the two photoluminescence peak of ZnO thin films one ultraviolet peak at 400 nm and one blue peak at 466 nm increased with increasing the working pressure. The ultraviolet peak was originated from the transition emission of the electrons from the conduction band to the valence band while the blue peak was originated from the defects in ZnO thin films.