Affiliation:
1. Jingdezhen Ceramic Institute
Abstract
Highly conductive and transparent TiO2 nano films have been deposited by R.F. magnetron sputtering method on glass substrates. The influence of argon gas pressure on deposition rate, electrical performance and surface morphology has been studied through the ellipsometric thickness gauge, scanning electron microscopy and energy disperse spectroscopy. The results show that, with the rise of argon gas pressure, the deposition rate reduces, resistivity decreases, roughness increases. When Ar pressure is 3.0Pa, the resistivity reached 3.3×105Ω•cm, sputtering pressure is lower, the surface atomic diffusion capacity is stronger, the film is more dence.
Publisher
Trans Tech Publications, Ltd.