Numerical Model to Describe the Growth of the Internal Oxidation Layer in Binary Alloys
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Published:2006-10
Issue:
Volume:258-260
Page:282-287
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ISSN:1662-9507
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Container-title:Defect and Diffusion Forum
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language:
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Short-container-title:DDF
Author:
Plascencia Gabriel1,
Utigard Torstein A.2,
Gutiérrez Juliana3,
Jaramillo David1,
Martínez Fernando1
Affiliation:
1. Instituto Politécnico Nacional
2. University of Toronto
3. SEPI ESIME Azcapotzalco IPN
Abstract
Several analytical models have been developed through the years to describe the
formation and growth of the internal oxidation layer in binary alloys. Such models are often
complex and their validity strongly rely on precise measurements of molar fluxes of the
different species involved in the oxidation process. The main disadvantage of such
measurements is that they are difficult to made and present a high degree of uncertainties,
thus some assumptions are needed to ease understanding and the applicability of them. In this
paper we set up a numerical scheme (finite differences) to describe the growth of the internal
oxidation layer in binary Cu-Al alloys oxidized in air at different temperatures. There is good
agreement between the experimental results and the values calculated with the aid of our
numerical approach.
Publisher
Trans Tech Publications, Ltd.
Subject
Condensed Matter Physics,General Materials Science,Radiation