Calculation of Surface Self-Diffusion Coefficients from AES Data on Decay of Thin Metal Films

Abstract

We propose a simple method for calculation of surface self-diffusion coefficients using kinetic data on the decay of thin films – void growth and transformation of the island shape to the equilibrium. Calculations are made taking into account equilibrium wetting angle of the film on a substrate. The kinetic data on the decay of Pd thin films on sapphire and silica substrates were obtained using Auger electron spectroscopy. By in situ monitoring the intensity of the Auger signal from the film, three different stages of the decay could be distinguished. The surface self-diffusion coefficients were calculated for the temperature range 583 – 823 K. The values of the surface diffusion coefficients and the activation energies are discussed compared to those obtained by other methods.