Impact of Proton Irradiation on Power 4H-SiC MOSFETs

Author:

Lebedev Alexander A.1,Kozlovski Vitalii V.2,Fursin Leonid3,Strel'chuk Anatoly M.4,Levinshtein Mikhail E.4,Ivanov Pavel A.4,Zubov Alexander V.5

Affiliation:

1. Ioffe Institute

2. St. Petersburg State Polytechnical University

3. United Silicon Carbide, Inc.

4. Ioffe Institute

5. National Research University of Information Technologies

Abstract

Impact of 15 MeV proton irradiation on electrical characteristics and low frequency noise has been studied in high-power vertical 4H-SiC MOSFETs of 1.2 kV-class at doses 1012 £ F £ 1014 cm-2. The maximum value of the field-effect mobility µ depends weakly on F up to F = 2×1013 cm-2. At F = 4×1013 cm-2, the character of the µ(Vg) dependence changes radically. The maximum µ decreases approximately threefold. The dose Fcr corresponding to the complete degradation of the device is about 1014 cm-2. It can be estimated as Fcr» he/n0, where he is the electron removal rate and n0 is the initial electron concentration in the drift layer. In the entire frequency range of analysis f, gate voltages, and drain-source biases, the frequency dependence of the current spectral noise density SI(f) follows the law SI ~ 1/f. From the data of noise spectroscopy, the density of traps in the gate oxide Ntv has been estimated. In non-irradiated structures, Ntv » 5.4×1018 cm-3eV-1. At Ф = 6×1013 cm-2, the Ntv value increases to Ntv » 7.2×1019cm-3eV-1. The non-monotonic behavior of the output current Id and the level of low frequency noise on dose F has been demonstrated.

Publisher

Trans Tech Publications, Ltd.

Subject

Mechanical Engineering,Mechanics of Materials,Condensed Matter Physics,General Materials Science

Reference9 articles.

1. M. Alexandru et al., IEEE Trans. Nucl. Sci. 61, 1732 (2014).

2. M. Florentin et al., Mater. Sci. Forum 806, 121 (2015).

3. J.F. Ziegler, J.P. Biersack, U. Littmark, The Stopping and Range of Ions in Matter, Pergamon Press, New York, (1985).

4. K. Kawahara et al., J. Appl. Phys. 115, 143705 (2014).

5. S. Rumayntsev et al., Semicond. Sci. Technol. 24, 075011 (2009).

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