Physical Investigations of Niobium Oxide Nanorod Imploring Laser Radiation

Abstract

In this work, the Nb2O5 nanostructure has been deposited using Q-switched Nd: YAG laser in the vacuum pressure of 0 bar pressure on quartz substrates. Physical properties of the prepared films at different substrate temperatures (300, 400, and 500) °C were characterized. The obtained results reflect the formation of good quality monoclinic Nb2O5 thin film. A clear blow shift was also obtained where the optical band gap increase from (to) with temperature. Finally, AFM results revealed the increase the surface roughness with substrate temperatures.