Affiliation:
1. Cree Incorporation
2. Cree Research, Inc.
3. Cree, Incorporation
4. Cree, Inc.
5. Wright-Patterson Air Force Base
Abstract
Due to the high critical field in 4H-SiC, the drain charge and switching loss densities in a SiC power device are approximately 10X higher than that of a silicon device. However, for the same voltage and resistance ratings, the device area is much smaller for the 4H-SiC device. Therefore, the total drain charge and switching losses are much lower for the 4H-SiC power device. A 2.3 kV, 13.5 mW-cm2 4H-SiC power DMOSFET with a device area of 2.1 mm x 2.1 mm has been demonstrated. The device showed a stable avalanche at a drain bias of 2.3 kV, and an on-current of 5 A with a VGS of 20 V and a VDS of 2.6 V. Approximately an order of magnitude lower parasitic capacitance values, as compared to those of commercially available silicon power MOSFETs, were measured for the 4H-SiC power DMOSFET. This suggests that the 4H-SiC DMOSFET can provide an order
of magnitude improvement in switching performance in high speed switching applications.
Publisher
Trans Tech Publications, Ltd.
Subject
Mechanical Engineering,Mechanics of Materials,Condensed Matter Physics,General Materials Science
Reference5 articles.
1. S. Ryu et al.,: MRS Proc. Vol. 764 (2003), p. C2. 7. 1.
2. K. Adachi et al.,: Mat. Sci. Forum Vols. 457 - 460 (2004), p.1233.
3. A. Q. Huang.: IEEE EDL, Vol. 25, No. 5 (2004), p.298.
4. http: /www. advancedpower. com.
5. http: /www. infineon. com/cmc_upload/documents/085/068/SPP_A11N80C3. pdf.
Cited by
9 articles.
订阅此论文施引文献
订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献