Analysis of SiC Islands Formation during First Steps of Si Carbonization Process

Author:

Méndez David1,Aouni A.,Araújo Daniel1,Bustarret Etienne2,Ferro Gabriel3,Monteil Yves4

Affiliation:

1. Universidad de Cádiz

2. Laboratoire d'Etudes des Propriétés Electroniques des Solides

3. Université de Lyon

4. Université Claude Bernard Lyon 1

Abstract

The effect of the temperature at which the carbon source is introduced in the reactor on the early stages of the carbonization process is analyzed here. Three samples heated up to 1150°C with propane introduction temperatures (Tintro) of 725, 1030 and 1100°C are analyzed by transmission electron microscopy and attenuated total reflectance. The size of the SiC nuclei increases with Tintro. There is also an effect on the strain of the resulting carbonization layer. The electron diffraction pattern of the sample with the highest Tintro shows a fully relaxed 3C-SiC layer, while no evidence of SiC relaxation is present in low Tintro samples where the SiC islands seems to be pseudomorphic.

Publisher

Trans Tech Publications, Ltd.

Subject

Mechanical Engineering,Mechanics of Materials,Condensed Matter Physics,General Materials Science

Reference9 articles.

1. P.A. Ivanov and V.E. Chelnokov, Semicond. Sci. Technol. Vol. 7 (1992), p.863.

2. P.G. Neudeck, SiC technology, in : W. -K. Chen (Ed. ), The VLSI Handbook, the Electrical Engineering Handbook Series, CRC Press and IEEE Press, Boca Raton, Florida, 2000, p.6. 1-6. 24.

3. http: /mems. cwru. edu/SiC.

4. M. Mehregany, C.A. Zorman, J. Cryst. Growth Vol. 355 (1999), p.518.

5. T. Chassagne, G. Ferro, D. Chaussende, F. Cauwet,Y. Monteil, J. Bouix, Thin Solid Films Vol. 402 (2002), p.83.

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