Affiliation:
1. Ubon Ratchathani University
2. Ubon Rachathani University
3. National Electronics and Computer Technology Center
4. King Mongkut's Institute of Technology Ladkrabang
Abstract
The report presents the effects of the thickness on the TiO2 thin films prepared by the GLAD technique with incline spinning substrate on rotating holder (ISSRH) by using the electron beam evaporation. The prepared films were heated at 500 °C for 2 hr in air. The microstructure of films was investigated by UV- visible photometer, X-ray diffraction, XRD and field emission scanning electron microscope, FE-SEM. The results showed the thickness of 10, 50, 100 and 300 nm films exhibited continuity distribution of the crystalline. The crystalline structure evidenced the dominant peak at the 300 nm thickness. GLAD TiO2 films exhibited the columnar growth and porosity. The TiO2 nanostructures showed rutile phase.
Publisher
Trans Tech Publications, Ltd.
Reference15 articles.
1. K. Robbie, MJ. J. Brett: Vac. Sci. Technology Vol. 15 (1997), p.1460.
2. K. Robbie, JC. Sit, MJ. J. Brett: Vac. Sci. Technology Vol. 16 (1998), p.1115.
3. A. Lakhtakia, R. Messier, MJ. Brett, K. Robbie: submitted to Journal of InnovationsMater Research (1996).
4. IJ. Hodgkinson, QH. Wu: Appl. Phys. Lett Vol. 74 (1999), p.1794.
5. IJ. Hodgkinson, QH. Wu: Adv. Mater Vol. 13 (2001), p.889.
Cited by
1 articles.
订阅此论文施引文献
订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献