Self-Stratification Silicon Gradient Film Prepared by Emulsion Blend Technique

Abstract

We investigated the effect of film-formation temperature andTg’s difference on the self-stratification gradient silicone film prepared by emulsion blend (poly(3-[tris(trimethyl silyloxy)silyl] propyl methacrylate-co-methyl methacrylate) /poly(butyl acrylate-co-methyl methacrylate) 50/50 by wt) (PTRIS-co-MMA/PBA-co-MMA) technique. The self-stratification film with gradient distribution of silicon was relatively easily obtained when both blend components could fully fuse to form a continuous film. Moreover, proper nonparallelTgs facilitated migration of the silicon component to the film-air interface during the film-formation and hence the gradient distribution was obtained. WhenTgof silicon-free component was 40°C, self-stratification gradient film with concentration of silicon components varying in a gradient-like manner along the overall transaction of the film was fabricated.