Electrical Characteristics of ZnTe Thermoelectric Thin Films

Author:

Chen Wen Shiush1,Hsu Cheng Hsing1,Kao Wen Hua1,Yu Yi Ting1,Yang Pai Chuan1,Tseng Ching Fang1,Lai Chun Hung1,Lee Ye Mu1,Yang Hsi Wen1,Lin Jenn Sen1

Affiliation:

1. National United University

Abstract

Thermal coating growth of ZnTe thermoelectric films were deposited on n-type Si substrate is studied. Structural analysis through x-ray diffraction (XRD) and scanning electron microscopy (SEM) were sensitive to the RTA treatment. The electrical properties and microstructure of these films were investigated with special emphasis on the effects of various annealing temperatures from 600°C to 800°C by RTA technique. The highest carrier concentration, lowest resistivity and mobility at an annealing temperature of 700°C are 3.5×1015cm-3, 0.25 Ω-cm, and 49 cm2V-1S-1. The resultant electrical properties have made ZnTe films as very interesting materials for thermoelectric device applications.

Publisher

Trans Tech Publications, Ltd.

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