Characterization of Micro-Gap Electrodes Initial Pattern on Resist by Employing High Sensitive and Selective Chrome Mask

Abstract

The detection of most serious diseases at early stages is one of the challenging tasks for researchers of nanotechnology. Therefore the current research article is one of the attempts to fabricate highly sensitive and selective micro-gap electrodes at initial level; such micro-gap electrodes will be used in future for inserting biomolecule in between the gap spacing. To transfer the micro-gap design pattern to sample wafer accurately and preciously, micro-gap was initially designed by using AutoCAD software and the design was finally transferred to high sensitive and selective chrome mask. The article demonstrates experimentally an initial strategy for fabrication of micro-gap electrodes at resisting using conventional photolithography technique coupled with the wet etching process. The structure morphology was characterized using high power and scanning electron microscope namely (HPM and SEM).