Joining with Electrochemical Support: Cold Pressure Welding of Copper – Weld Formation and Characterization

Author:

Schmidt Hans Christian1,Rodman Dmytro2,Grydin Olexandr2,Ebbert Christoph3,Homberg Werner1,Maier Hans Jurgen2,Grundmeier Guido3

Affiliation:

1. University of Paderborn

2. Leibniz Universität Hannover

3. Universität Paderborn

Abstract

Cold pressure welding is a versatile process that can be used to weld most metals. It is, however, difficult to achieve a weld at room temperature through the application of pressure. As in every welding process, several different parameters have to be considered: the metals to be welded and their properties in terms of surface condition, cleanliness, strength of the metal, and so on. The surface condition and surface preparation methods are the most important parameters, since the cold weld is based solely on the contact between the two metal surfaces that are involved. Joining with electrochemical support (ECUF) is a new approach that overcomes most of the current process barriers and limitations through optimized electrochemical surface treatment and an improved process technology based on a pilger roll. This paper provides an overview of the ECUF process and current research results on the pressure welding of pure copper (CW004A). The formation of the weld has been investigated and the welding interface characterized in respect of its microstructure.

Publisher

Trans Tech Publications, Ltd.

Subject

General Engineering

Reference9 articles.

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2. Mori, K. -i., Bay, N., Fratini, L., Micari, F., Tekkaya, A. E.: Joining by plastic deformation, CIRP Annals - Manufacturing Technology 62 (2), 2013, pp.673-694.

3. Tylecote, R. F.: Investigation on Pressure Welding. British Welding Journal 1, 1954, pp.117-135.

4. Schmidt, H. C. and Homberg, W.: Hybrid - Neue Werkstoffe und Prozesse für den Leichtbau. In: Brosius, A. (Ed. ), 20. Sächsische Fachtagung Umformtechnik. 2013, pp.25-32.

5. Seo, M., Ishikawa, Y., Kodaira, M., Sugimoto, A., Nakayama, S., Watanabe, M., Furuya, S., Minamitani, R., Miyata, Y., Nishikata, A., Notoya, T.: Cathodic reduction of the duplex oxide films formed on copper in air with high relative humidity at 60 °C. Corros. Sci. 47, 2005, p.2079–(2090).

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