Optimized Technical Characteristics of Polysilicon Nanofilm

Abstract

In order to take good advantage of polysilicon nanofilm, optimized technical characteristics of the polysilicon nanofilm are very necessary to investigated. In this paper, the polysilicon nanofilms were prepared under different technical parameters, including thickness and doping concentration, which are very important for preparation of the nanofilm. The experimental results of piezoresistive and temperature characteristics show that the optimized technical characteristics are followed, the thickness is about 90nm, and the doping concentration is about 4.1×?1019cm-3 or between 2.0×?1020cm-3 and 4.1×?1020cm-3 from different point of view. The investigations of optimized technical characteristics are very useful for application of the polysilicon nanofilm to piezoresistive sensor.