Evaluation of GMR Head Durability against Nanoscale Scratches Using High-Field Transfer Curves

Abstract

We investigated the durability of giant magnetoresistive (GMR) heads to nanoscale scratches created during the lapping process. Analysis using high-field transfer curves after deliberate scratching with an atomic force microscope (AFM) identified changes in the magnetization of the head and a reduction in pinning strength, which is a magnetic performance indicator. Additionally, finite element method (FEM) analysis suggested that the overall effects on the GMR head following nanoscale scratching increased with scratch depth.