Affiliation:
1. Guangxi University
2. Guangdong University of Technology
3. Guang Xi University
Abstract
The influence of different dispersants and suspending agents of CeO2 polishing powder was investigated, including sodium hexametaphosphate, polyethyleneglycoll, polyacrylic acid, anionic polyacrylamide, and their mixtures. The suspension stability of ceria particles in slurries and the pH dependence were examined by the measurement of zeta potential, sedimentation and viscosity, etc. The material removal rate and surface roughness of different slurries for K9 glass polishing were studied. The slurry mixed by three kinds of dispersants can achieved the maximum material removal rate and the minimum surface roughness.
Publisher
Trans Tech Publications, Ltd.
Cited by
9 articles.
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