Micro-Raman Analysis on Scratch of Si Surface Modified by Ion Implantation
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Published:2008-03
Issue:
Volume:373-374
Page:497-500
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ISSN:1662-9795
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Container-title:Key Engineering Materials
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language:
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Short-container-title:KEM
Author:
Lei Zhen Kun1,
Pan Xue Min1,
Liu Gang1,
Yun Hai2,
Mu Zong Xin1
Affiliation:
1. Dalian University of Technology
2. Shandong University of Technology
Abstract
Surface modification mechanism on scratch of ion implanted p-Si (100) is investigated by
scanning electric microscopy and micro-Raman spectroscopy. Raman experimental results reveal that
the amorphous Si appears near the scratch during the scratching process, while the ion implantation
adjusts the structural parameters of the amorphous Si and changes the residual stress state of the
surface scratch from tension to compression. Moreover, Raman experimental results reveal that the
laser power synchronously decreases Raman shift and full width of half maximum intensity (FWHM).
The laser heating effect can be neglected because a lower laser power is selected in our measurements.
Publisher
Trans Tech Publications, Ltd.
Subject
Mechanical Engineering,Mechanics of Materials,General Materials Science
Cited by
1 articles.
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