A Resistivity Model for Electrophoretic Deposition

Abstract

Electrophoretic deposition (EPD) is a powerful method for obtaining particulate layers in a broad range of thicknesses if an adequate control of the growing kinetics is reached. Existing models of EPD kinetics consider that the growth of the deposit increases linearly with deposition time and deviations are due to a reduction of powder concentration and/or a decrease of electric field when EPD is performed at constant voltage conditions. Experimental observations show that long time tests lead to a S-shaped growing kinetics. This work presents a resistivity model that predicts a S-shape variation of mass per unit area with deposition time, with a first step in which the deposition rate increases, as a consequence of resistivity changes, followed by a decreasing slope associated to the lose of powder concentration. Currently available EPD models, such as the Hamaker and Sarkar & Nicholson models are particular cases of the generalized resistivity model proposed in this work.