Affiliation:
1. Nanjing University of Aeronautics and Astronautics
Abstract
Chemical vapor deposition (CVD) diamond is known for its superior characteristics such
as hardness, toughness and wear resistance. However, due to these factors, machining CVD
diamond is a difficult material removal process. A new technique to polish CVD diamond film
efficiently is reported in the present paper. In the CVD deposition process, boron was doped into
diamond to fabricate high-quality semi-conductive film, which make it possible to machine
diamond film by electro discharged machining (EDM) method. The relationship between EDM
parameter and removal processing was investigated in details. The machined surface of boron
doped (B-doped) diamond films was studied by Scanning Electron Microscope (SEM) and Raman
Scattering Spectroscopy (Raman). The experimental results show that EDM polishing is a highspeed
material removal and low cost method for CVD diamond polishing. When the discharge
current and pulse-on time increase in a certain range, the cutting-off speed and roughness will
increase correspondingly. The roughness of EDM polished CVD diamond film surface is Ra<0.5μm
when the discharge current is at 4A and pulse-on time is at 200μs.
Publisher
Trans Tech Publications, Ltd.
Subject
Mechanical Engineering,Mechanics of Materials,General Materials Science
Reference14 articles.
1. D. Zuo, B.K. Xiang, W.Z. Lu and et al: Proc. 6 th ICPMT (Xi'an, China Sept 18-23 2002).
2. D. Zuo, X.F. Li, M. Wang and et al: Proc. IMCC'2000 ( HongKong, Aug 59-61, 2000).
3. C.J. Tang, A.J. Neves, A.J.S. Fernandes and et al: Diamond and Related Materials, Vol. 12 (2003) No. 8, pp.1411-1416.
4. A.P. Malshe, B.S. Park, W.D. Brown and et al: Diamond and Related Materials, Vol. 8 (1999), pp.1198-1213.
5. R. Kuschnereit, P. Hess, D. Albert and et al: Thin Solid Films, Vol. 312 (1998), pp.66-72.
Cited by
9 articles.
订阅此论文施引文献
订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献