Remote Microwave Plasma Enhanced Chemical Vapor Deposition (RMPECVD) of Silica and Alumina Films
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Published:2001-12
Issue:
Volume:206-213
Page:559-562
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ISSN:1662-9795
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Container-title:Key Engineering Materials
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language:
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Short-container-title:KEM
Author:
Desmaison Jean1,
Hidalgo H.,
Tristant P.,
Naudin F.,
Merle D.
Affiliation:
1. Science des Procédés Céramiques et de Traitements de Surface
Publisher
Trans Tech Publications, Ltd.
Subject
Mechanical Engineering,Mechanics of Materials,General Materials Science