Preparation of Epitaxial LiTaO<sub>3</sub> Thin Films by Metal Organic Chemical Vapor Deposition and its Electrical and Optical Properties-Reference-Cited by-同舟云学术

Preparation of Epitaxial LiTaO₃ Thin Films by Metal Organic Chemical Vapor Deposition and its Electrical and Optical Properties

Published:2006-09 Issue: Volume:320 Page:57-60
ISSN:1662-9795
Container-title:Key Engineering Materials
language:
Short-container-title:KEM

Author:

Yamamoto Takeki¹,Wakiya Naoki²,Mizutani Nobuyasu¹,Shinozaki Kazuo¹

Affiliation:

1. Tokyo Institute of Technology

2. Shizuoka University

Abstract

Epitaxial LiTaO3 thin films were deposited on epitaxial Pt(111)/Al2O3(001) and Al2O3(001) substrates by metal organic chemical vapor deposition using LiTa(OC2H5)4(OC2H4OCH3)2 and Li(DPM) precursors. The full-width at half-maximum of the rocking curve of LiTaO3 thin films were respectively 0.29° on Al2O3(001) substrates and 0.98° on epitaxial Pt(111)/Al2O3(001). Electrical measurements showed that the remanent polarization and coercive field of the films were 2Pr=76 μC/cm2 and E =130 kV/cm, respectively. The leakage current density was 10-6–10-8 A/cm2 at 120 kV/cm. Refractive indices n measured at 632.8 nm were measured respectively as 2.15 on Al2O3(001) and 2.14 on Pt(111)/Al2O3(001).

Publisher

Trans Tech Publications, Ltd.

Subject

Mechanical Engineering,Mechanics of Materials,General Materials Science

Link

https://www.scientific.net/KEM.320.57.pdf

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