Affiliation:
1. Dong-Eui University
2. Tokushima University
3. University of Tokushima
Abstract
The thin films of indium tin oxide (ITO) are used for a variety of electronic devices such as
solar cells, touch panels, liquid crystal displays (LCDs). However, these electronic devices are not
strong enough against heavy impact since their ITO thin films are deposited on glass substrates.
Therefore, ITO thin films were prepared by the inclination opposite target type DC magnetron
sputtering equipment onto the Polyethylene Terephthalate (PET) substrate at room temperature using
oxidized ITO with In2O3 and SnO2 in a weight ratio of 9:1. In this study, the transmittance, resistivity
and electromagnetic wave shielding effectiveness of the ITO thin films prepared at various sputtering
time (20~80min namely film thickness; 130~500nm) are measured. The results show that
transmittance of the ITO thin films could show about 70% in the range of a visible ray by the variation
of film thickness. It also can be seen that a minimum exists in the resistivity of ITO thin films for the
variation of film thickness. Electromagnetic wave shielding effectiveness was increased as film
thickness increased.
Publisher
Trans Tech Publications, Ltd.
Subject
Mechanical Engineering,Mechanics of Materials,General Materials Science
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