Features of the Band-Edge Injection Electroluminescence in 4H-SiC pn Structures

Author:

Strel'chuk Anatoly M.1,Kuz’michev Yury S.2,Shtel’makh Konstantin F.3

Affiliation:

1. Russian Academy of Sciences

2. Svetlana-ep

3. St.Petersburg State Polytechnical University

Abstract

Band-edge (hνmax=3.17-3.18 eV at T=293 K) injection electroluminescence (IEL) characteristics of 4H-SiC pn structures as a function of doping, electron irradiation, temperature, and current are presented. The intensity of the UV band increases with temperature in the range 290-800 K (with an activation energy Ea of about 90 meV), which is observed for the first time in a wide range of current densities from 9 A/cm2 up to 2∙104 A/cm2. This effect is a fundamental feature of the band-edge IEL in SiC pn structures. The dependence of the intensity L on the current is of the power-law type, L~Jm; at high currents m≈1 at T=650-800 K. This result is probably the first direct observation of the diffusion current in SiC pn structures. The rise in the intensity of the band-edge IEL with increasing temperature and its decrease upon irradiation are probably due to the corresponding change in the lifetime of nonequilibrium carriers.

Publisher

Trans Tech Publications, Ltd.

Subject

Mechanical Engineering,Mechanics of Materials,Condensed Matter Physics,General Materials Science

Reference4 articles.

1. V. A. Dmitriev, P. A. Ivanov, V. I. Levin, I. V. Popov, A. M. Strel'chuk, Yu. M. Tairov, V. F. Tsvetkov, V. E. Chelnokov, Fabrication of epitaxial silicon carbide pn structures obtained from bulk SiC crystals, Sov. Tech. Phys. Lett. 13 (1987).

2. M. M. Anikin, A. M. Strel'chuk, A. L. Syrkin, V. E. Chelnokov, A. E. Cherenkov, Temperature and current dependence of the intensity of the edge injection electroluminescence of SiC p-n structures, Semiconductors 28 (1994) 171-174.

3. A M. Strel'chuk, E. V. Kalinina, A A. Lebedev, Temperature dependence of the band-edge injection electroluminescence of 4H-SiC pn structure, Mater. Sci. Forum 740-742 (2013) 569-572.

4. M. E. Levinshtein, S. L. Rumyantsev, M. S. Shur, Properties of advanced semiconductor materials: GaN, AlN, InN, BN, SiC, SiGe, John Wiley and sons, Inc., 2001, 8-9.

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