Study on Low TCR TaN Thin Film Resistors by D.C. Magnetron Sputtering-Reference-Cited by-同舟云学术

Study on Low TCR TaN Thin Film Resistors by D.C. Magnetron Sputtering

Published:2014-12 Issue: Volume:1082 Page:34-37
ISSN:1662-8985
Container-title:Advanced Materials Research
language:
Short-container-title:AMR

Author:

Wang Bin¹,Song Zhen Guo¹,Cao Qian Tao¹

Affiliation:

1. China Electronics Technology Corporation

Abstract

In this paper, TaN thin film were deposited on ceramic substrates by D.C. magnetron sputtering. The surface morphology of two types of TaN thin film resistors were investigated by SEM. The characteristics of the TaN thin film resistor was also studied. The key point was put on the TCR of the TaN thin film resistors. The resistors were trimmed by the autoxidation process and the anodic oxidation process, and the TCR values of about +21ppm/°C and-137.3ppm/°C in average have been achieved respectively.

Publisher

Trans Tech Publications, Ltd.

Subject

General Engineering

Link

https://www.scientific.net/AMR.1082.34.pdf

Reference7 articles.

1. GAO Liang, Research Status and Application of Tantalum Nitride Thin Film by Deposition, Materials Review. 24(2010) 20-25.

2. Y.M. Lu, Electrical properties of TaxNy films by implementing OES in the sputtering system, Materials Chemistry and Physics. 72 (2001) 278-280.

3. BAI Ya-xu YUAN Zheng-xi HE Wei HE Bo MO Yun-qi, Control of electrical resistivity of TaN thin films by reactive sputtering for embedded passive resistors, Integrated PCB. 12 (2010)55-58.

4. LIU Feifei, TANG Yun, ZHANG Wanli, JIANG Hongchuan, SI Xu, Effect of heat treatment on the electric properties of TaN thin films, ELECTRONIC COMPONENTS AND MATERIALS. 30 (2011) 47-49.

5. Y.M. Zhou, Z. Xie H.N. Xiao, P.F. Hu,J. He. Structure and properties of Ta/TaO× barrier films deposited by direct current magnetron sputtering, Vacuum. 84(2009)330-334.

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